Semiconductor and Technology Videos

The Award Winning Silicon Run Video Series

Photolithography in Semiconductor Manufacturing

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SILICON RUN LITHOGRAPHY examines the role of photolithography in imaging and printing the many intricate layers of integrated circuits. Focusing on critical and non-critical mask levels of a CMOS transistor, this video takes a close look at the manufacturing materials, tools, and processes that have made more precise and complex submicron lithography possible.

SILICON RUN LITHOGRAPHY shows how mask patterns are greatly reduced and precisely positioned on silicon wafers using "step and repeat" and "step and scan" exposure processes.

Running Time: 31 minutes

"I wish I’d seen this video when I first started in lithography field. I would have quickly explained things I didn’t know. It wasn’t until nine months on the job that I really began to understand the whole process."

"I have viewed two of your videos SILICON RUN I and SILICON RUN LITHOGRAPHY, and I give them both two thumbs up."

Partially Funded by Intel Foundation, Applied Materials, Nikon Precision, Shipley, Inc., Cymer, Inc., Prism Technologies, KLA-Tencor, and SEMI

• CMOS Review
• Mask Design
• Photoresist Manufacture
• Resist Tolerances
• Resolution Factors
• Track Systems
• Coat, Develop & Wafer Prep
• Exposure Energy Sources
• Image Reduction
• I-Line Steppers
• DUV Scanners
• Critical Alignment
• Critical Dimension
• Standing Waves
• Anti-Reflective Coat
• Defect Inspection